Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Sputtering targets formed from cast materials

Sputtering targets formed from cast materials

US Patent 6878250 · Granted Apr 12, 2005

Estimated economic value: $13,039,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

ECAE processing for high strength and high hardness aluminum alloys2025
Profiled sputtering target and method of making the same2025
ECAE processing for high strength and high hardness aluminum alloys2023
Large-grain tin sputtering target2022
ECAE materials for high strength aluminum alloys2022
Frictionless forged aluminum alloy sputtering target with improved properties2022
ECAE materials for high strength aluminum alloys2022
Profiled sputtering target and method of making the same2022
Method of forming copper alloy sputtering targets with refined shape and microst2021
High strength aluminum alloy backing plate and methods of making2021
ECAE materials for high strength aluminum alloys2020
Copper manganese sputtering target2020