Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Method of etching materials patterned with a single layer 193nm resist

Method of etching materials patterned with a single layer 193nm resist

US Patent 6875559 · Granted Apr 5, 2005

Estimated economic value: $1,884,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Inactivated Bacillus coagulans and uses thereof for increasing physical performa2022
Probiotic sports nutrition compositions2022
Probiotic sports nutrition compositions2022
Inactivated bacterial cell formulation2017
Inactivated bacterial cell formulation2016
Inactivated bacterial cell formulation2015
Structures comprising masks comprising carbon2015
Structure, synthesis, and applications for oligo phenylene ethynylenes2014
Inactivated bacterial cell formulation2013
Inactivated bacterial cell formulation2013
Semiconductor device fabrication and dry develop process suitable for critical d2013
Methods of forming DRAM arrays2011