Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Vortex phase shift mask for optical lithography

Vortex phase shift mask for optical lithography

US Patent 6811933 · Granted Nov 2, 2004

Assignee

No assignee recorded.

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Photosensitive material for immersion photolithography2005
Photosensitive material for immersion photolithography2005
Detection of adsorbates on interior surfaces of holey fibers2005
Modified tunable acousto-optic filter2004
Optical transmitter comprising a stepwise tunable laser2004
Diffusion barriers for holey fibers2003
Optical transmitter comprising a stepwise tunable laser2003
Holey fibers filled with raman active fluid2002
Generic phase shift masks2002
Generic phase shift masks2001
Generic phase shift mask2001
Optical heterodyne detection for cavity ring-down spectroscopy2000