Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Plasma enhanced method for increasing silicon-containing photoresist selectivity

Plasma enhanced method for increasing silicon-containing photoresist selectivity

US Patent 6799907 · Granted Oct 5, 2004

Estimated economic value: $16,478,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Laminate structure and wearable article2025
Composite structure and method of manufacture2025
Composite structure2025
Protective shield, shield wall and shield wall assembly2023
Clustering for prediction models in process control and for optimal dispatching2015
Forming interconnect structures using pre-ink-printed sheets2014
Automatic virtual metrology for semiconductor wafer result prediction2014
Near non-adaptive virtual metrology and chamber control2013
Method and system for controlling copper chemical mechanical polish uniformity2013
Methodology to enable wafer result prediction of semiconductor wafer batch proce2012
System for extraction of key process parameters from fault detection classificat2011
System and method for enhanced control of copper trench sheet resistance uniform2010