Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Plasma etching apparatus with focus ring and plasma etching method

Plasma etching apparatus with focus ring and plasma etching method

US Patent 6726799 · Granted Apr 27, 2004

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Method for manufacturing a semiconductor device having a dummy section2025
Method for manufacturing a semiconductor device having a dummy section2023
Device with pillar-shaped components2021
Method for manufacturing a semiconductor device having a dummy section2021
Device with pillar-shaped components2019
Semiconductor device having a dummy portion, method for manufacturing the semico2018
Device with pillar-shaped components2017
Device with pillar-shaped components2016
Method of fabricating a conductive post on an electrode2012
Method for manufacturing semiconductor device2011
Method of manufacturing semiconductor device2009
Semiconductor device and method of fabricating the same2003