Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Method for improved dielectric layer metrology calibration

Method for improved dielectric layer metrology calibration

US Patent 6710889 · Granted Mar 23, 2004

Estimated economic value: $6,610,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Light-emitting diode and manufacturing method thereof2025
Semiconductor device2025
Semiconductor device structure having gate dielectric layer2025
Super-resolution using natural handheld-motion applied to a user device2024
Integrated display with antenna system and method2024
Teaching pendant of an electromechanical system2024
Notebook computer equipped with variable aspect ratio screen2024
Doping for semiconductor device with conductive feature2024
Optical image stabilization movement to create a super-resolution image of a sce2024
Antenna array for use in mobile devices2024
Semiconductor devices and methods for forming the same2024
Sterilization apparatus for portable electronic device2024