Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Chemical modification of substrates by photo-ablation under different local atmospheres and chemical environments for the fabrication of microstructures

Chemical modification of substrates by photo-ablation under different local atmospheres and chemical environments for the fabrication of microstructures

US Patent 6703189 · Granted Mar 9, 2004

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Dynamic buffer management in data-driven intelligent network2025
System and method for facilitating data request management in a network interfac2025
Endoluminal sizing device2025
Devices, systems and methods for temporary attachment of a safety line to dental2024
Apparatuses, systems and methods for hydrocarbon material from a subterranean fo2023
Reagent synthesis and testing assays to detect and quantify manganese (II)2023
In situ injection or production via a well using selective operation of multi-va2023
Method of optimizing operation one or more tubing strings in a hydrocarbon well,2022
Apparatuses, systems and methods for hydrocarbon material from a subterranean fo2022
In situ injection or production via a well using selective operation of multi-va2022
Apparatus and method for controlling moisture in the manufacture of glass fiber 2016
Squeeze clip ground strap2016