Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Pattern formation method and method and apparatus for production of a semiconductor device using said method

Pattern formation method and method and apparatus for production of a semiconductor device using said method

US Patent 6673526 · Granted Jan 6, 2004

Estimated economic value: $900,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Semiconductor storage device and operation method thereof2011
Fuel injection pump2008
Photomask2008
Directional coupler switch2006
Start assister of fuel injection pump2005
Exposure apparatus, semiconductor device, and photomask2003
PLL controller, method of PLL control, and limiter2002
Method of forming polycrystalline silicon layer on substrate and surface treatme2000
Process of forming pattern and exposure apparatus1999
Method of forming polycrystalline silicon layer on substrate and surface treatme1999
Semiconductor device containing Si, O and N anti-reflective layer1997
Data transmission system having a backup testing facility1997