Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Deflection lens device for electron beam lithography

Deflection lens device for electron beam lithography

US Patent 6653645 · Granted Nov 25, 2003

Assignee

No assignee recorded.

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Parallel multi-electron beam lithography for IC fabrication with precise X-Y tra2006
Color CRT electron gun with progressively reduced electron beam passing aperture2004
Deflection lens device for electron beam lithography2004
Multi-layer common lens arrangement for main focus lens of multi-beam electron g2004
Clean room arrangement for electron beam lithography2003
Beam forming region for electron gun2003
Multi-beam index CRT with horizontal phosphor lines2002
Multi-beam group electron gun for beam index CRT2002
QPF electron gun with high G4 voltage using internal resistor2000
Color CRT electron gun with asymmetric auxiliary beam passing aperture2000
Multi-mode, hybrid-type CRT and electron gun therefor with selectable different 1997
Dynamic off-axis defocusing correction for deflection lens CRT1997