Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Semiconductor-air gap grating fabrication using a sacrificial layer process

Semiconductor-air gap grating fabrication using a sacrificial layer process

US Patent 6649439 · Granted Nov 18, 2003

Estimated economic value: $20,698,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Air data probe with optical pressure integration2020
Manufacturing semiconductor-based multi-junction photovoltaic devices2019
Manufacturing semiconductor-based multi-junction photovoltaic devices2018
System and method for probe heater health indication2018
Manufacturing semiconductor-based multi-junction photovoltaic devices2015
Methods of determining water droplet size distributions of clouds2014
In-flight multiple field of view detector for supercooled airborne water droplet2012
Membrane grating for beam steering device and method of fabricating same2011
Membrane grating for beam steering device and method of fabricating same2011
Apparatus and method for in-flight detection of airborne water droplets and ice 2011
High index-step grating fabrication using a regrowth-over-dielectric process2005
High index-step grating fabrication using a regrowth-over-dielectric process2005