Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › System and method for adhesion improvement at an interface between fluorine doped silicon oxide and tantalum

System and method for adhesion improvement at an interface between fluorine doped silicon oxide and tantalum

US Patent 6642619 · Granted Nov 4, 2003

Estimated economic value: $3,831,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Metal oxide varistor with reinforced electrodes2024
Contacts for semiconductor devices2023
Contacts for semiconductor devices2021
Contacts for semiconductor devices2019
Prefabricated lightweight steel wall tensioning system2017
Insulated thermal cut-off device2017
Method for manufacturing a surface mount device2017
Method for manufacturing a surface mount device2017
Programmable latency count to achieve higher memory bandwidth2016
Electrically programmable and eraseable memory device2016
Method for achieving very small feature size in semiconductor device by undertak2016
Method for manufacturing a contact for a semiconductor component and related str2015