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Home › Photomask, method of lithographically structuring a photoresist layer with the photomask, and method of producing magnetic memory elements

Photomask, method of lithographically structuring a photoresist layer with the photomask, and method of producing magnetic memory elements

US Patent 6620559 · Granted Sep 16, 2003

Estimated economic value: $252,000 ⓘ

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