Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Deposition of titanium amides

Deposition of titanium amides

US Patent 6602783 · Granted Aug 5, 2003

Estimated economic value: $25,352,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Precursors and flowable CVD methods for making low-K films to fill surface featu2025
Compositions and methods using same for deposition of silicon-containing film2025
Silicon compounds and methods for depositing films using same2025
Compositions and methods using same for deposition of silicon-containing film2025
Siloxane compositions and methods for using the compositions to deposit silicon 2025
Compositions comprising silacycloalkanes and methods using same for deposition o2025
Compositions and methods using same for deposition of silicon-containing film2025
Compositions and methods using same for deposition of silicon-containing film2024
Alkoxysilacyclic or acyloxysilacyclic compounds and methods for depositing films2024
Methods for depositing silicon-containing films2023
Stable alkenyl or alkynyl-containing organosilicon precursor compositions2023
Compositions and methods for making silicon containing films2023