Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Plasma etch method with enhanced endpoint detection

Plasma etch method with enhanced endpoint detection

US Patent 6593232 · Granted Jul 15, 2003

Estimated economic value: $6,934,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Participant sorting in video conferencing2025
Automatic test pattern generation-based circuit verification method and apparatu2025
Test circuit in chip and circuit test method2025
Chip test circuit and circuit test method2024
Multimedia information processing method and apparatus, and storage medium2024
Decompression circuit, circuit generation method, and IC chip2024
Tape dispenser2024
Backlight control device and method based on sound feature lid state detection2024
Film dispenser2024
Film dispenser2024
Tape dispenser2023
Barbell support assembly2023