Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Method for forming multiple gate oxide layer with the plasma oxygen doping

Method for forming multiple gate oxide layer with the plasma oxygen doping

US Patent 6593182 · Granted Jul 15, 2003

Estimated economic value: $79,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Determining part stress with in situ sensors2023
Method of forming a high temperature sensor2023
Waist trimmer2021
Protocol conversion method, platform, and protocol conversion gateway2020
Fluorescent probes for detecting hydrogen polysulfides2019
Reaction-based fluorescent probes for sulfane sulfur and the application in bioi2016
Detecting and identifying connectivity in a network2013
Method for forming a gate2005
Duplex light transceiver module2005
Duplex focusing device2004
Method for fabricating shallow trench isolation2003
Method for forming ultra-shallow junction by boron plasma doping2003