Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Shallow angle interference process and apparatus for determining real-time etching rate

Shallow angle interference process and apparatus for determining real-time etching rate

US Patent 6585908 · Granted Jul 1, 2003

Estimated economic value: $9,870,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Hybrid panel method of manufacturing electronic devices and electronic devices m2024
Hybrid panel method of manufacturing electronic devices and electronic devices m2023
In-situ absolute measurement process and apparatus for film thickness, film remo2010
Apparatus and process for treating dielectric materials2010
Electrodeless lamp for emitting ultraviolet and/or vacuum ultraviolet radiation2007
Apparatus and process for measuring light intensities2006
Plasma process and apparatus2005
Process for optically erasing charge buildup during fabrication of an integrated2004
Dielectric barrier discharge apparatus and process for treating a substrate2003
Process for optically erasing charge buildup during fabrication of an integrated2003
Tunable radiation source providing a VUV wavelength planar illumination pattern 2003
Optimized optical system design for endpoint detection2003