Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Method of reshaping a patterned organic photoresist surface

Method of reshaping a patterned organic photoresist surface

US Patent 6582861 · Granted Jun 24, 2003

Estimated economic value: $19,441,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

FIB-SEM 3D tomography for measuring shape deviations of HAR structures2025
Parameterizing x-ray scattering measurement using slice-and-image tomographic im2025
Contact area size determination between 3D structures in an integrated semicondu2025
Method for measuring a sample and microscope implementing the method2023
Method of reducing critical dimension bias during fabrication of a semiconductor2010
Method of reducing the average process bias during production of a reticle2008
Reticle fabrication using a removable hard mask2008
Apparatus used in reshaping a surface of a photoresist2007
Apparatus used in reshaping a surface of a photoresist2007
Method of producing a patterned photoresist used to prepare high performance pho2007
Method of producing a patterned photoresist used to prepare high performance pho2007
Method of increasing the shelf life of a photomask substrate2006