Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Fluoropolymer-coated photomasks for photolithography

Fluoropolymer-coated photomasks for photolithography

US Patent 6566021 · Granted May 20, 2003

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Method and apparatus for data protection, readable medium and electronic device2025
Data protection method, apparatus, medium and electronic device2025
Speaker diaphragm structure2020
Pellicles with reduced particulates2015
Antistatic optical pellicle2003
Removable optical pellicle2003
Photomask protection system2001
Optical pellicle and package1998
Protective mask for pellicle1995