Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Measurement of substrate temperature in a process chamber using non-contact filtered infrared pyrometry

Measurement of substrate temperature in a process chamber using non-contact filtered infrared pyrometry

US Patent 6563092 · Granted May 13, 2003

Estimated economic value: $19,076,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Particle reactor for atomic layer deposition (ALD) and chemical vapor deposition2018
Multi-station sequential curing of dielectric films2018
Systems for uniform heat transfer including adaptive portions2017
Multi-station sequential curing of dielectric films2015
Single-chamber sequential curing of semiconductor wafers2015
Method for reducing stress in porous dielectric films2014
Multi-station sequential curing of dielectric films2014
Multi-station sequential curing of dielectric films2013
Pedestal heat transfer and temperature control2011
Apparatus and methods for processing semiconductor substrates using supercritica2009
Method for filling of a recessed structure of a semiconductor device2008
Cast pedestal with heating element and coaxial heat exchanger2008