Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Synthetic quartz glass for optical member, process for producing the same, and method of using the same

Synthetic quartz glass for optical member, process for producing the same, and method of using the same

US Patent 6544914 · Granted Apr 8, 2003

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Method of producing SiC—Si composite component and SiC—Si composite component2025
Reflective mask blank for EUV lithography2021
Composition for bonding2020
Reflective mask blank for EUV lithography, and process for its inspection and pr2017
Reflective mask blank for EUV lithography, method of manufacturing thereof, refl2016
SPARC-derived tumor rejection antigenic peptides and medicaments comprising the 2015
Reflective layer-equipped substrate for EUV lithography, reflective mask blank f2015
Multilayer substrate, manufacturing method for multilayer substrate, and quality2014
Reflecting mask blank, method for manufacturing reflective mask blank and method2014
Multilayer mirror for EUV lithography and process for its production2013
Optical member base material for EUV lithography, and method for producing same2013
SPARC-derived tumor rejection antigenic peptides and medicaments comprising the 2013