Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Method and apparatus for improving resist pattern developing

Method and apparatus for improving resist pattern developing

US Patent 6537734 · Granted Mar 25, 2003

Estimated economic value: $3,754,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Wafer alignment marks protected by photoresist2005
Photoexposure method for facilitating photoresist stripping2003
Method and apparatus for improving resist pattern developing2003
Method and apparatus for improving resist pattern developing2002
Wafer alignment marks protected by photoresist2001
Baking of photoresist on wafers2000
Acoustic wave enhanced spin coater2000
Acoustic wave enhanced developer2000
Acoustic wave enhanced developer1999
Acoustic wave enhanced spin coating method1999
Baking of photoresist on wafers1998
Test apparatus and method for testing integrated circuit modules having visual d1998