Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Process for metal metalloid oxides and nitrides with compositional gradients

Process for metal metalloid oxides and nitrides with compositional gradients

US Patent 6537613 · Granted Mar 25, 2003

Estimated economic value: $52,333,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Volatile dihydropyrazinly and dihydropyrazine metal complexes2021
Volatile dihydropyrazinly and dihydropyrazine metal complexes2018
Precursors for CVD silicon carbo-nitride films2017
Methods of fabricating dielectric films from metal amidinate precursors2016
Complexes of imidazole ligands2015
Methods for depositing oxygen deficient metal films2015
Metal-enolate precursors for depositing metal-containing films2015
Methods for depositing silicon carbo-nitride film2015
Volatile group 2 metal precursors2014
Volatile imidazoles and group 2 imidazole based metal precursors2014
Complexes of imidazole ligands2014
Liquid precursor for depositing group 4 metal containing films2013