Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Self-aligned fabricating process and structure of source line of etox flash memory

Self-aligned fabricating process and structure of source line of etox flash memory

US Patent 6524909 · Granted Feb 25, 2003

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Semiconductor device2025
Manufacturing method of semiconductor structure and semiconductor structure ther2025
Semiconductor device and method of manufacture2025
Method for manufacturing through vias using amorphization to adjust etching rate2025
Semiconductor devices and methods for increased capacitance2025
Semiconductor structure and forming method thereof2025
Semiconductor devices and methods for increased capacitance2025
Semiconductor device including unilaterally extending gates and method of formin2025
Work piece holder and method of transferring a work piece2025
Gate electrode having a work-function layer including materials with different a2024
Semiconductor device structure and methods of forming the same2024
Circuit structure with gate configuration2024