Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Method for suppressing optical proximity effect bias within a wafer

Method for suppressing optical proximity effect bias within a wafer

US Patent 6497982 · Granted Dec 24, 2002

Estimated economic value: $1,522,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Pressure tank2025
Pressure tank2016
Router2014
Router2014
Pressure tank2014
Pressure tank2013
Method for eliminating color forming impurities from nitro compounds2012
Method for OPC correction2012
Pressure tank having plural access openings2011
Systems and methods for determining width/space limits for a mask layout2011
Systems and methods for determining width/space limits for mask layout2009
Method of correcting mask pattern2008