Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Method of forming retrograde doping file in twin well CMOS device

Method of forming retrograde doping file in twin well CMOS device

US Patent 6455402 · Granted Sep 24, 2002

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Method of making a semiconductor device having a gate electrode with an hourglas2006
Latch-up resistant CMOS structure2004
Method for fabricating MOS field effect transistor2003
Apparatus and method for heat-treating semiconductor substrate2003
Method for fabricating a bipolar semiconductor device2002
Semiconductor device2002
MOS device having non-uniform dopant concentration and method for fabricating th2002
Method for forming semiconductor device having a gate in the trench2002
Method of making a SOI device having fixed channel threshold voltage2002
SOI (silicon on insulator) device2002
Semiconductor device and method for fabricating the same2002
Latch-up resistant CMOS structure2001