Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Sidewall process for forming a low resistance source line

Sidewall process for forming a low resistance source line

US Patent 6429093 · Granted Aug 6, 2002

Estimated economic value: $34,133,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Sulfonate electroplating bath, process for refining metal by electrolytic deposi2025
Step cutting thrombectomy device and thrombectomy system2025
Method for improving message storage efficiency of network chip, device, and sto2024
Data read/write method and apparatus, and exchange chip and storage medium2024
Information processing method and electronic device2020
Electronic device, display processing method and non-transitory computer readabl2020
Electronic device and information processing method2020
Electronic device and mode switching method2020
Electronic device and information processing method2020
Inspection systems for quarantine and methods thereof2019
Inspection devices for quarantine2019
Display processing method, apparatus and program product for a bendable electron2019