Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Focused ion beam etching of copper

Focused ion beam etching of copper

US Patent 6407001 · Granted Jun 18, 2002

Estimated economic value: $57,699,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

System for reclaiming, rebalancing and recirculating laser gas mixtures used in 2018
System for reclaiming, rebalancing and recirculating laser gas mixtures used in 2017
Chlorine dioxide sensor2011
Forming a semiconductor device feature using acquired parameters2009
Forming a semiconductor device feature using acquired parameters2006
Focused ion beam etching of copper with variable pixel spacing2003