Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Microwave plasma processing apparatus having a vacuum pump located under a susceptor

Microwave plasma processing apparatus having a vacuum pump located under a susceptor

US Patent 6358324 · Granted Mar 19, 2002

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Plasma processing device, and plasma processing method2025
Plasma source and plasma processing apparatus2025
Notification control device and notification control method2025
Plasma processing apparatus2025
Plasma processing apparatus and plasma processing method2025
Plasma processing apparatus2025
Plasma processing apparatus and plasma processing method2025
Plasma processing apparatus and plasma processing method2025
Monitoring system, storage medium storing computer program for monitoring and me2025
Plasma processing apparatus and plasma processing method2025
Plasma processing apparatus2025
Plasma processing apparatus, and plasma processing method2025