Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Process for treating a semiconductor substrate

Process for treating a semiconductor substrate

US Patent 6354309 · Granted Mar 12, 2002

Estimated economic value: $13,941,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Distribution body for a process fluid for chemical and/or electrolytic surface t2025
Method and device for plating a recess in a substrate2024
Method and device for plating a recess in a substrate2021
Wet-dry integrated wafer processing system2019
Self aligned contact structure2018
Method and apparatus for surface treatment using inorganic acid and ozone2017
Self-aligned contact structure2017
Channel protection during fin fabrication2016
Methods and structures for protecting one area while processing another area on 2016
Wet bottling process for small diameter deep trench capacitors2016
Self-aligned contact structure2016
Selective etching bath methods2015