Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Simplified method of patterning field dielectric regions in a semiconductor device

Simplified method of patterning field dielectric regions in a semiconductor device

US Patent 6335235 · Granted Jan 1, 2002

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Memory cell system with charge trap2012
System and method for integrated circuit device design and manufacture using opt2010
System and method for designing an integrated circuit device2009
Optical proximity correction (OPC) technique to compensate for flare2008
Optimizing an integrated circuit layout by taking into consideration layout inte2007
System and method for automatic generation of optical proximity correction (OPC)2007
System and method for integrated circuit device design and manufacture using opt2007
Method and system for metrology recipe generation and review and analysis of des2007
System and method for design rule creation and selection2007
Immersion lithographic process using a conforming immersion medium2006
CVD gas injector and method therefor2006
Method of developing optimized optical proximity correction (OPC) fragmentation 2006