Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Method for controlling a gas injector in a semiconductor processing reactor

Method for controlling a gas injector in a semiconductor processing reactor

US Patent 6328221 · Granted Dec 11, 2001

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Rapid thermal process reactor utilizing a low profile dome2013
Rapid thermal process reactor utilizing a low profile dome2013
Gas ring and method of processing substrates2010
Gas ring and method of processing substrates2010
Gas flow controller system2004
Method of controlling gas flow to a semiconductor processing reactor2004
Rotating susceptor2003
Linear robot2002
Gas dispersion head2002
Gas dispersion head2002
Particulate free air bearing and seal2002
Exhaust particulate controller and method2002