Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Method and apparatus for reducing contamination in a wafer loadlock of a semiconductor wafer processing system

Method and apparatus for reducing contamination in a wafer loadlock of a semiconductor wafer processing system

US Patent 6323463 · Granted Nov 27, 2001

Estimated economic value: $67,261,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Methods and systems for temperature control for a substrate2025
Process kit enclosure system2024
Enclosure system having walls comprising sidewalls and radio-frequency identifie2024
Method of forming retaining ring with shaped surface2023
Process kit ring adaptor2023
Apparatus and process for determining the distance between a glass substrate and2023
Retaining ring with shaped surface and method of forming2023
Retaining ring with shaped surface2022
Multi-object capable loadlock system2021
Process kit ring adaptor2021
Retaining ring with shaped surface2020
Semiconductor processing chamber2020