Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Mask pattern correction process, photomask and semiconductor integrated circuit device

Mask pattern correction process, photomask and semiconductor integrated circuit device

US Patent 6303251 · Granted Oct 16, 2001

Estimated economic value: $141,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Semiconductor device2016
Semiconductor device2013
Semiconductor integrated circuit apparatus with low wiring resistance2011
Semiconductor device, method of generating pattern for semiconductor device, met2011
Method of fabricating a semiconductor device and a method of generating a mask p2010
Semiconductor device method of generating semiconductor device pattern method of2007
Design method for semiconductor integrated circuit suppressing power supply nois2007
Area ratio/occupancy ratio verification method and pattern generation method2007
Solid-state image pickup apparatus2007
Method of producing semiconductor devices2007
Layout verification method and method for designing semiconductor integrated cir2007
Semiconductor device, method of generating pattern for semiconductor device, met2007