Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Method for forming a semiconductor device using a mask having a self-assembled monolayer

Method for forming a semiconductor device using a mask having a self-assembled monolayer

US Patent 6297169 · Granted Oct 2, 2001

Estimated economic value: $29,150,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Systems and methods of creating multiple electron beams2023
Fuel additive system for a diesel fuel engine2021
Mixed metal borohydrides2018
Extractor electrode for electron source2018
Fuel unit, gas generator and system2017
Method for preparation of an alane-etherate complex and alane2017
Hydrogen generator2017
Hydrogen generator2016
Methods of generating hydrogen gas and power2014
Hydrogen generator2014
EUV mask defect reconstruction and compensation repair2014
Stationary and dynamic radial transverse electric polarizer for high numerical a2009