Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Fluoride gas etching of silicon with improved selectivity

Fluoride gas etching of silicon with improved selectivity

US Patent 6290864 · Granted Sep 18, 2001

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Apparatuses and methods for limiting load current in nanosecond pulsed power sou2025
Nanosecond pulsed power sources having multi-core transformers2025
Display screen with graphical user interface for stringing equipment2025
Hybrid installation apparatus and processes2025
Intelligent electrical conductor installation system2024
Nanosecond pulsed electric field system2024
Nanosecond pulsed power sources having multi-core transformers2023
Nanosecond pulsed power sources having multi-core transformers2022
Sheave for electrical stringing block2018
Medical cable including authentication circuit2016
Micromirror array assembly2016
Display mounting systems2014