Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Reference calibration patch arrangement to minimize exposure and measurement artifacts and maximize robustness to defects

Reference calibration patch arrangement to minimize exposure and measurement artifacts and maximize robustness to defects

US Patent 6284445 · Granted Sep 4, 2001

Estimated economic value: $12,932,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Entangling projectile system for the disabling of UAV's and other targets of int2025
Delivering fluid to a subsea wellhead2025
Coating of glass-based assembly2025
Delivering fluid to a subsea wellhead2024
Entangling projectile system for the disabling of UAV's and other targets of int2023
Coated glass articles and processes for producing the same2023
Therapeutic pressure, thermal, and/or other treatment modality systems and metho2023
Ultrasonic tank and methods for uniform glass substrate etching2023
Delivering fluid to a subsea wellhead2022
Well stimulation operations2022
Methods of continuous fabrication of holes in flexible substrate sheets and prod2021
Coated glass articles and processes for producing the same2021