Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Use of alkylated polyamines in photoresist developers

Use of alkylated polyamines in photoresist developers

US Patent 6268115 · Granted Jul 31, 2001

Estimated economic value: $24,896,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Polymer-coated member having a reticulated foam substrate with an open-cell foam2025
Polymer coating for selective separation of hydrophobic particles in aqueous slu2025
Processes for coating reticulated foams2024
Ketimines of benzylated polyamines as curing agents2017
Liquid methylenedianiline compositions2016
Oxypentafluorosulfate compositions and processes for making them2010
Cellulosic composition2009
Fluorinated alkyl substituted-thieno[3,4-b]thiophene monomers and polymers there2009
Bis(3-alkoxypropan-2-ol) sulfides, sulfoxides, and sulfones: new preparative met2009
Fluorinated alkyl substituted-thieno[3,4-]thiophene monomers and polymers theref2008
Acetylenic diol ethylene oxide/propylene oxide adducts and processes for their m2008
Pentafluorosulfanyl-substituted thienothiophene monomers and conducting polymers2007