Home › Method of manufacturing a semiconductor device in a silicon body, a surface of said silicon body being provided with an alignment grating and an at least partly recessed oxide pattern

Method of manufacturing a semiconductor device in a silicon body, a surface of said silicon body being provided with an alignment grating and an at least partly recessed oxide pattern

US Patent 6255189 · Granted Jul 3, 2001

Assignee

U.S. Philips

Inventors

Christiaan J. Muller (3 patents)
Frank Arnoldus Johannes Maria Driessen (6 patents)

View full patent text on Google Patents →