Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Contact and deep trench patterning

Contact and deep trench patterning

US Patent 6204187 · Granted Mar 20, 2001

Estimated economic value: $3,303,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

System and method for optimizing through silicon via overlay2025
System and method for determining post bonding overlay2025
Semiconductor device including bonding pad metal layer structure2024
System and method for mitigating overlay distortion patterns caused by a wafer b2024
Self-contained fire extinguisher with automated fire detection2024
System and method for determining post bonding overlay2023
System and method for mitigating overlay distortion patterns caused by a wafer b2023
Semiconductor device including bonding pad metal layer structure2023
Automated fire detection with portable fire extinguisher2022
Method of manufacturing a superjunction semiconductor device2022
Temperature-based fire protection2020
Systems and methods for controlling an etch process2019