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Home › Radio frequency supply circuit for in situ cleaning of plasma-enhanced chemical vapor deposition chamber using NF3 or NF3/He mixture

Radio frequency supply circuit for in situ cleaning of plasma-enhanced chemical vapor deposition chamber using NF3 or NF3/He mixture

US Patent 6199506 · Granted Mar 13, 2001

Estimated economic value: $67,980,000 ⓘ

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