Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Overlay measurement technique using moire patterns

Overlay measurement technique using moire patterns

US Patent 6150231 · Granted Nov 21, 2000

Estimated economic value: $39,339,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Method of making sensor platform using a non-horizontally oriented nanotube elem2013
Sensor platform using a horizontally oriented nanotube element2012
One-time programmable, non-volatile field effect devices and methods of making s2012
Non-volatile electromechanical field effect devices and circuits using same and 2011
Nanotube-on-gate FET structures and applications2011
Sensor platform using a non-horizontally oriented nanotube element2010
Sensor platform using a horizontally oriented nanotube element2010
Devices having vertically-disposed nanofabric articles and methods of making the2010
Devices having horizontally-disposed nanofabric articles and methods of making t2009
Non-volatile electromechanical field effect devices and circuits using same and 2009
Sensor platform using a non-horizontally oriented nanotube element2009
Sensor platform using a non-horizontally oriented nanotube element2008