Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Method for fabricating high-density semiconductor read-only memory device

Method for fabricating high-density semiconductor read-only memory device

US Patent 6143610 · Granted Nov 7, 2000

Estimated economic value: $5,759,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Semiconductor structure and method of forming the same2025
High electron mobility transistor device and manufacturing method thereof2025
High electron mobility transistor device and manufacturing method thereof2025
GaN device with N2 pre-treatment and method of performing N2 pre-treatment2025
High electron mobility transistor device and manufacturing method thereof2025
Integrated circuit and method of manufacturing same2022
Non-volatile memory device and manufacturing method thereof2022
Method for fabricating memory cell2009
Method of fabricating a recess channel transistor2009
Fabrication method of metal oxide semiconductor transistor2009
Semicondutor device and manufacturing method thereof2008
Dynamic random access memory device2008