Assignee
Inventors
- Pascal Doppelt (6 patents)
{"@context": "https://schema.org", "@type": "BreadcrumbList", "itemListElement": [{"@type": "ListItem", "position": 1, "name": "Home", "item": "https://www.patentleaderboard.com/"}, {"@type": "ListItem", "position": 2, "name": "Copper (1) precursors for chemical deposit in gas phase of metallic copper", "item": "https://www.patentleaderboard.com/patent/6130345"}]}
Skip to contentUS Patent 6130345 · Granted Oct 10, 2000