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Home › Method of reducing carbon contamination of a thin dielectric film by using gaseous organic precursors, inert gas, and ozone to react with carbon contaminants

Method of reducing carbon contamination of a thin dielectric film by using gaseous organic precursors, inert gas, and ozone to react with carbon contaminants

US Patent 6124158 · Granted Sep 26, 2000

Estimated economic value: $49,575,000 ⓘ

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