Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Planarization method for self-aligned contact process

Planarization method for self-aligned contact process

US Patent 6110827 · Granted Aug 29, 2000

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Through silicon via structure having protection ring2014
Trench-capacitor DRAM device and manufacture method thereof2008
Gap-filling process2004
Method for manufacturing a copper fuse structure2004
Direct determination of interface traps in MOS devices2004
Method of cleaning a dual damascene structure2004
Method of cleaning a dual damascene structure2004
Copper fuse structure and method for manufacturing the same2003
Method of cleaning a dual damascene structure2003
Method of fabricating system on chip device2003
Method for fabricating a MOS transistor of an embedded memory2003
Memory structure with thin film transistor and method for fabricating the same2003