Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Use of a polish stop layer in the formation of metal structures

Use of a polish stop layer in the formation of metal structures

US Patent 6103625 · Granted Aug 15, 2000

Estimated economic value: $313,766,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Wrap-around trench contact structure and methods of fabrication2025
Self-aligned contacts2025
Multi-threshold voltage devices and associated techniques and configurations2024
Heterogeneous metal line compositions for advanced integrated circuit structure 2024
Self-aligned contacts2024
Wrap-around trench contact structure and methods of fabrication2023
Self-aligned contacts2023
Heterogeneous metal line compositions for advanced integrated circuit structure 2023
Silicide structure of an integrated transistor device and method of providing sa2022
Multi-threshold voltage devices and associated techniques and configurations2022
Self-aligned contacts2021
Wrap-around trench contact structure and methods of fabrication2020