Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Single-substrate-heat-treatment apparatus in semiconductor processing system

Single-substrate-heat-treatment apparatus in semiconductor processing system

US Patent 6080965 · Granted Jun 27, 2000

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Plasma processing method for forming a silicon nitride film on a silicon oxide f2009
Untreated body transfer device and semiconductor manufacturing device with the u2008
Plasma processing apparatus2004
Plasma processing apparatus2004
Plasma processing apparatus2003
Carrier system positioning method2003
Plasma processing apparatus with a dielectric plate having a thickness based on 2002
Vertical-heat-treatment apparatus with movable lid and compensation heater movab2001
Light source device2000
Boat for heat treatment1998
Processing method for wafers1994
Processing system1993