Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Forming CMOS transistor using diffusion source and wet/dry oxidation

Forming CMOS transistor using diffusion source and wet/dry oxidation

US Patent 5981321 · Granted Nov 9, 1999

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Operation method of multi-bits read only memory2024
Operation method of multi-bits read only memory2023
Manufacturing method of a semiconductor component with a nanowire channel2013
Single-electron transistor and fabrication method thereof2005
Solutions and processes for removal of sidewall residue after dry etching2003
Solutions for cleaning silicon semiconductors or silicon oxides2003
Method of oxidizing a nitride film on a conductive substrate2001
Self-aligned tungsten strapped source/drain and gate technology for deep submicr1998
Process for suppressing boron penetration in BF.sub.2 .sup.+ -implanted P.sup.+ 1997
Method for growing field oxides in LOCOS technique1995