Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Lithographic process and energy-sensitive material for use therein

Lithographic process and energy-sensitive material for use therein

US Patent 5958654 · Granted Sep 28, 1999

Estimated economic value: $63,761,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Adapting electrical, mechanical, and thermal properties of package substrates2024
PVD buffer layers for LED fabrication2021
Method for treatment of diarrhea-predominant irritable bowel syndrome2018
Methods and apparatus for controlling photoresist line width roughness with enha2018
PVD buffer layers for LED fabrication2016
Methods of and factories for thin-film battery manufacturing2016
Method of patterning a device2016
Methods for reducing line width roughness and/or critical dimension nonuniformit2016
Patterning of magnetic thin film using energized ions2016
Photoresist treatment method by low bombardment plasma2015
Coating compositions2015
Methods of and hybrid factories for thin-film battery manufacturing2015