Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Ion implanter with post mass selection deceleration

Ion implanter with post mass selection deceleration

US Patent 5932882 · Granted Aug 3, 1999

Estimated economic value: $128,735,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Systems and methods for delivery of content in association with notification mes2025
Subscription management and web-based activity tracking in a computing environme2025
Parallel routing for wireless handoffs2024
Subscription management and web-based activity tracking in a computing environme2023
Parallel routing for wireless handoffs2022
In situ angle measurement using channeling2022
Ion implantation for modification of thin film coatings on glass2022
Multi-piece substrate holder and alignment mechanism2020
Ion implant system having grid assembly2020
System of height and alignment rollers for precise alignment of wafers for ion i2020
Patterned chuck for substrate processing2019
Substrate processing system and method2018